Solid Surfaces, Interfaces and Thin Films by Hans Lüth

By Hans Lüth

This booklet emphasises either experimental and theoretical points of floor, interface and thin-film physics. As in prior variants the guidance of surfaces and skinny movies, their atomic and morphological constitution, their vibronic and digital houses in addition to basics of adsorption are taken care of. due to their value in sleek info expertise and nanostructure learn, specific emphasis is paid to digital floor and interface states, semiconductor area cost layers and heterostructures. a different bankruptcy of the ebook is dedicated to collective phenomena at interfaces and in skinny motion pictures similar to superconductivity and magnetism. The latter subject contains the in the meantime vital concerns substantial magnetoresistance and spin-transfer torque mechanism, either results being of excessive curiosity in details expertise. during this re-creation, for the 1st time, the influence of spin-orbit coupling on floor states is taken care of. during this context the category of the lately detected topological insulators, fabrics of vital value for spin electronics, are mentioned. specific emphasis, hereby, is laid at the new kind of topologically safe floor states with well-defined spin orientation. additionally, a few very important good demonstrated experimental suggestions corresponding to X-ray diffraction (XRD) and mirrored image anisotropy spectroscopy (RAS), that have been lacking to this point in past variations, have been additional during this new 6th variation of the book.

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24) Panel II φ = 127◦ 17 . 24 Panel II Basics of Particle Optics and Spectroscopy Panel II Fig. 7 Schematic plot of a high-resolution electron energy loss spectrometer consisting of a cathode system (filament with lens system), a monochromator (cylindrical sectors), a similar analyzer and a detector. The monochromator can be rotated around an axis through the sample surface. The whole set up is mounted on a UHV flange The final current density at the exit, then follows as jf ∝ ji E ∝ ( E)5/2 . 25) This dependence, which is confirmed well by experiment, causes a strong reduction of the transmitted current with narrower entrance slits.

1–1 µm/h. This corresponds to an arrival rate F at the substrate of 1015 –1016 molecules/(s cm2 ). 4 Evaporation and Molecular Beam Epitaxy (MBE) 39 Fig. 2 Melting temperature Tm for selected materials, and crucible source (Knudsen type) temperature TS necessary to establish an equilibrium vapor pressure P (TS ) of 10−2 Torr. This pressure is convenient to achieve reasonable evaporation rates in MBE Material Melting temp. Tm [°C] Source temp. 5) to be in the range 10−2 –10−3 Torr. The temperatures needed to establish a pressure of 10−2 Torr in the cell can be evaluated from the vapor pressure plots in Fig.

According to Fig. 5. 15 eV for AlAs (indirect gap). According to Fig. 12 other III–V alloys suitable for good heteroepitaxial growth in MBE are AlP/GaP and AlSb/GaSb. , InP/CdS or InSb/PbTe/CdTe. Interesting heteroepitaxy is also possible for elemental semiconductors on III–V compounds, and vice versa. , for Ge on GaAs and Si on GaP (Fig. 12). On GaAs(110) surfaces cleaved in UHV Ge grows epitaxially at substrate temperatures above 300 °C. Below this temperature the deposited Ge layer is polycrystalline.

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